23 lines
527 B
Markdown
23 lines
527 B
Markdown
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title = "Position control in lithographic equipment"
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author = ["Thomas Dehaeze"]
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draft = false
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+++
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Tags
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: [Multivariable Control]({{< relref "multivariable_control" >}}), [Positioning Stations]({{< relref "positioning_stations" >}})
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Reference
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: ([Butler 2011](#org79c48f7))
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Author(s)
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: Butler, H.
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Year
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: 2011
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## Bibliography {#bibliography}
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<a id="org79c48f7"></a>Butler, Hans. 2011. “Position Control in Lithographic Equipment.” _IEEE Control Systems_ 31 (5):28–47. <https://doi.org/10.1109/mcs.2011.941882>.
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