25 lines
736 B
Markdown
25 lines
736 B
Markdown
+++
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title = "Position control in lithographic equipment"
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author = ["Dehaeze Thomas"]
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draft = true
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+++
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Tags
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: [Multivariable Control]({{< relref "multivariable_control.md" >}}), [Positioning Stations]({{< relref "positioning_stations.md" >}})
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Reference
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: (<a href="#citeproc_bib_item_1">Butler 2011</a>)
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Author(s)
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: Butler, H.
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Year
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: 2011
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## Bibliography {#bibliography}
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<style>.csl-entry{text-indent: -1.5em; margin-left: 1.5em;}</style><div class="csl-bib-body">
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<div class="csl-entry"><a id="citeproc_bib_item_1"></a>Butler, H. 2011. “Position Control in Lithographic Equipment.” <i>IEEE Control Systems</i> 31 (5): 28–47. doi:<a href="https://doi.org/10.1109/mcs.2011.941882">10.1109/mcs.2011.941882</a>.</div>
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</div>
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