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Thomas Dehaeze
2024-12-17 15:37:17 +01:00
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content/article/butler11_posit_contr_lithog_equip.md
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## Bibliography {#bibliography}
<style>.csl-entry{text-indent: -1.5em; margin-left: 1.5em;}</style><div class="csl-bib-body">
<div class="csl-entry"><a id="citeproc_bib_item_1"></a>Butler, Hans. 2011. “Position Control in Lithographic Equipment.” <i>Ieee Control Systems</i> 31 (5): 28–47. doi:<a href="https://doi.org/10.1109/mcs.2011.941882">10.1109/mcs.2011.941882</a>.</div>
<div class="csl-entry"><a id="citeproc_bib_item_1"></a>Butler, Hans. 2011. “Position Control in Lithographic Equipment.” <i>IEEE Control Systems</i> 31 (5): 28–47. doi:<a href="https://doi.org/10.1109/mcs.2011.941882">10.1109/mcs.2011.941882</a>.</div>
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