21 lines
766 B
Markdown
21 lines
766 B
Markdown
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title = "Position control in lithographic equipment"
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author = ["Thomas Dehaeze"]
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draft = false
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Tags
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: [Multivariable Control]({{< relref "multivariable_control" >}}), [Positioning Stations]({{< relref "positioning_stations" >}})
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Reference
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: <sup id="6a014e3a2ee3e41d20bd0644654c56f0"><a href="#butler11_posit_contr_lithog_equip" title="Hans Butler, Position Control in Lithographic Equipment, {IEEE Control Systems}, v(5), 28-47 (2011).">(Hans Butler, 2011)</a></sup>
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Author(s)
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: Butler, H.
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Year
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: 2011
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# Bibliography
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<a id="butler11_posit_contr_lithog_equip"></a>Butler, H., *Position control in lithographic equipment*, IEEE Control Systems, *31(5)*, 28–47 (2011). http://dx.doi.org/10.1109/mcs.2011.941882 [↩](#6a014e3a2ee3e41d20bd0644654c56f0)
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