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Thomas Dehaeze
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<h1 class="post-title">Position control in lithographic equipment</h1>
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<dt>Tags</dt>
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<dd><a href="/zettels/multivariable_control/">Multivariable Control</a>, <a href="/zettels/positioning_stations/">Positioning Stations</a></dd>
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<dt>Reference</dt>
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<dd><sup id="6a014e3a2ee3e41d20bd0644654c56f0"><a href="#butler11_posit_contr_lithog_equip" title="Hans Butler, Position Control in Lithographic Equipment, {IEEE Control Systems}, v(5), 28-47 (2011).">(Hans Butler, 2011)</a></sup></dd>
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<dt>Author(s)</dt>
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<dd>Butler, H.</dd>
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<dt>Year</dt>
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<dd>2011</dd>
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<h1 id="bibliography">Bibliography</h1>
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<p><a id="butler11_posit_contr_lithog_equip"></a>Butler, H., <em>Position control in lithographic equipment</em>, IEEE Control Systems, <em>31(5)</em>, 28–47 (2011). <a href="http://dx.doi.org/10.1109/mcs.2011.941882">http://dx.doi.org/10.1109/mcs.2011.941882</a> <a href="#6a014e3a2ee3e41d20bd0644654c56f0">↩</a></p>
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