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+title = "Advanced motion control: an industrial perspective"
+author = ["Thomas Dehaeze"]
+draft = true
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+
+Tags
+:
+
+
+Reference
+: ([Steinbuch and Norg 1998](#org162af57))
+
+Author(s)
+: Steinbuch, M., & Norg, M.
+
+Year
+: 1998
+
+
+## Bibliography {#bibliography}
+
+<a id="org162af57"></a>Steinbuch, M., and M.L. Norg. 1998. “Advanced Motion Control: An Industrial Perspective.” _European Journal of Control_ 4 (4):278–93. <https://doi.org/10.1016/s0947-3580(98)70121-9>.
diff --git a/content/inproceedings/heertjes20_contr.md b/content/inproceedings/heertjes20_contr.md
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+title = "Control of wafer scanners: methods and developments"
+author = ["Thomas Dehaeze"]
+draft = false
++++
+
+Tags
+:
+
+
+Reference
+: ([Heertjes et al. 2020](#org38a977c))
+
+Author(s)
+: Heertjes, Marcel Fran\ccois, Butler, H., Dirkx, N., van der Meulen, S., Ahlawat, R., O'Brien, K., Simonelli, J., …
+
+Year
+: 2020
+
+
+## Bibliography {#bibliography}
+
+<a id="org38a977c"></a>Heertjes, Marcel François, Hans Butler, NJ Dirkx, SH van der Meulen, R Ahlawat, K O’Brien, J Simonelli, KT Teng, and Y Zhao. 2020. “Control of Wafer Scanners: Methods and Developments.” In _2020 American Control Conference (ACC)_, 3686–3703. IEEE.